Lithography Metrology Equipment Market Expected to Reach $681.4 Million, Globally, by 2026 at 7.2% CAGR: Allied Market Research
The global lithography metrology equipment market size is expected to witness considerable growth, due to emergence of internet of things (IoT) in semiconductor manufacturing and fabrication process. The lithography metrology equipment industry is projected to witness significant growth, especially in the emerging economies such as Asia-Pacific and LAMEA, owing to the development of semiconductor industry in the regions.
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According to a recent report published by Allied Market Research, titled," Lithography Metrology Equipment Market by Technology, Product, Connectivity, and Application: Global Opportunity Analysis and Industry Forecast, 2018-2026," the global market was valued at $382.6 million in 2018, and is projected to reach $681.4 million by 2026, registering a CAGR of 7.2% from 2019 to 2026.
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Lithography is a process in which a pattern from a photomask is transferred to the surface of the wafer. During the lithography process, the wafer gets exposed to ultraviolet laser beam, in which the ultraviolet laser beam passes through photomask layer without a pattern and is irradiated onto photoresist on a wafer. Metrology is essential to control, optimize, and ensure the highest yield in semiconductor manufacturing processes. The lithography metrology equipment has created growth avenues in the semiconductor industry due to its high adoption rates globally.
Prime determinants of growth:
The factors such as high demand for miniaturized electronic devices, increase in trends toward Internet of Things (IoT), growth in the semiconductor industry, problems regarding metrology challenges for complex ICs, and emerging trends toward increase in investment in wafer fabrication equipment and materials are expected to significantly affect the growth of the global lithography metrology equipment market size. These factors are anticipated to either drive or hamper the lithography metrology equipment growth.
Report Coverage and Details:
Aspects
Details
By Technology
CRITICAL DIMENSION SCANNING ELECTRON MICROSCOPE (CD-SEM)
OPTICAL CRITICAL DIMENSION METROLOGY (OCD)
OVERLAY CONTROL
OTHERS
By Product
CHEMICAL CONTROL EQUIPMENT
GAS CONTROL EQUIPMENT
OTHERS
By Process
EDGE
CLOUD
By Application
QUALITY CONTROL & INSPECTION
REVERSE ENGINEERING
VIRTUAL SIMULATION
OTHERS
COVID-19 Scenario:
Metrology and inspection are important for the measurement of the semiconductor manufacturing process. This process is established at critical point of semiconductor manufacturing process to ensure accurate yield. Lithography metrology equipment are used for various factors such as critical dimension measurement, imaging of wafer patterns using photoresist, defect analysis, pattern process development, and material screening. A major restraint, which affects the lithography metrology market is rapid advancement of patterning technology, which increases its overall cost.
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Leading Market Players:
The report provides a detailed analysis of these key players of the global lithography metrology equipment market. These players have adopted different strategies such as product development and product launch to increase their market share and maintain dominant shares in different regions. The report is valuable in highlighting business performance, operating segments, product portfolio, and strategic moves of market players to showcase the competitive scenario.
Key Benefits for Stakeholders:
Based on technology, the CD-SEM segment generated the highest revenue in the global lithography metrology equipment market in 2018.
Based on industry, the chemical control equipment segment generated the highest revenue in the lithography metrology equipment market share in 2018.
Based on application, the quality control and inspection segment generated the highest revenue in the lithography metrology equipment market forecast in 2018.
By Region:
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