#lipss

April 23, 2009 - Sakhir, Bahrain

Impact of film thickness in laser-induced periodic structures on amorphous Si films

Since the scientists at Bell Labs invented the world's first transistor in December 1947, a revolution in microelectronics technology has profoundly affected lifestyles worldwide. As electronics get smaller and smaller, it is a challenge to find an easy, fast, and low-cost way to fabricate micro-nano components. Traditional direct writing fabrication methods such as mechanical scribing, focused ion beam etching, electron beam lithography, multiphoton polymerization, and thermal scanning probe etching are inefficient. Although methods such as nanoimprinting, photolithography, plasma etching, and scanning laser interference etching can effectively increase the processing speed, they generally require multiple process steps such as making masks or require very harsh working environments and rely on special materials. Using a femtosecond laser to induce surface self-organized periodic structure to manufacture nano-grating structure has attracted attention. Laser-induced periodic surface structures (LIPSS) uses the interference between incident light and surface electromagnetic waves to etch the material, so it has high processing accuracy. Moreover, compared with the traditional laser interference processing method, the self-organized processing method makes its experimental setup simple and scanning with a large light spot makes its fabrication speed rapidly high.